ELECTRON BEAM EXCITATION PLASMA GENERATOR

PURPOSE:To make adjustment in orbital direction and axial deviation of an electron beam as desired and conduct positively fine working by ion drydtching as designed in an electron beam excitation plasma generator (EBEP), orbit of the electron beam not being affected by geomagnetism or magnetic field...

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Main Authors YAMASHITA SEIJI, KAJIYAMA YOUSUKE, HARA TAMIO, HAMAGAKI MANABU, KASA YOSHITOKU, RIYUUJI MAKOTO, AOYANAGI KATSUNOBU, TOKAI MASAKUNI
Format Patent
LanguageEnglish
Published 20.10.1995
Edition6
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE:To make adjustment in orbital direction and axial deviation of an electron beam as desired and conduct positively fine working by ion drydtching as designed in an electron beam excitation plasma generator (EBEP), orbit of the electron beam not being affected by geomagnetism or magnetic fields in output generation devices, etc., of other facilities. CONSTITUTION:A field forming electrode 16 and a magnet as orbit displacement mechanism are disposed in and out a casing for an electron beam acceleration region 9 in an electron-irradiation cathode 6'. It is then connected electrically to a controller 19 via an alternating current conversion device 18. A positional adjustment dimensional directions is disposed to the irradiation cathode 6' for an electron beam 6''.
Bibliography:Application Number: JP19940081096