MANUFACTURE OF SWITCHING ELEMENT

PURPOSE:To manufacture an MIM element and a TFT element which have uniform characteristics all over the large area. CONSTITUTION:When an insulating film is formed on the surface of first metal 2 of an MIM element or a TFT element by using an anodic oxidation method, anodic oxidation treatment is per...

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Bibliographic Details
Main Authors HOSHINO KOICHI, ISHIDA TAKAO
Format Patent
LanguageEnglish
Published 22.08.1995
Edition6
Subjects
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
ELECTRICITY
FREQUENCY-CHANGING
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL LOGIC ELEMENTS
OPTICS
PHYSICS
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Summary:PURPOSE:To manufacture an MIM element and a TFT element which have uniform characteristics all over the large area. CONSTITUTION:When an insulating film is formed on the surface of first metal 2 of an MIM element or a TFT element by using an anodic oxidation method, anodic oxidation treatment is performed while a glass board 1 is brought down in anodic oxidation liquid 10 or while the surface of the anodic oxidation liquid 10 is lifted. Thereby a uniform insulating film can be formed, and an MIM element and a TFT element having uniform characteristics can be manufactured.
Bibliography:Application Number: JP19940016179