LIQUID CRYSTAL DISPLAY DEVICE AND ITS PRODUCTION

• Main Authors: KAWACHI GENSHIROU, SATO TSUTOMU
• Format: Patent
• Language: English
• Published: 22.08.1995
• Edition: 6
• Subjects: BASIC ELECTRIC ELEMENTS; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; SEMICONDUCTOR DEVICES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

PURPOSE:To decrease internal stresses and to prevent film peeling by incorporat ing scanning signal electrodes, video signal electrodes or transistor electrodes while providing a second high melting metal with a concn. gradient into a base material consisting of a first high melting point. CONSTITUTION:The scanning signal electrodes 12 consisting of Al and an alumina films 13 formed by an anodic oxidation method are formed on a glass substrate. A gate silicon nitride film 14 and an a-Si film 15 are formed to cover these electrodes and filmes. An n type amorphous silicon film 16 is formed in contact parts of video electrodes 17 and source electrodes 18. These video signal electrodes 17 and source electrodes 18 are formed by adding the high melting metal 2 (Ti) so as to have the temp. gradient after the film formation of the high melting metal 1 (Cr). Namely, the Cr has a high tensile stress and is, therefore, liable to cause film peeling after film formation but the tensile force of the Cr film is relieved by adding the Ti thereto after the film formation.