MAGNETO-RESISTANT MULTILAYERED FILM AND PRODUCTION THEREOF

• Main Authors: TAKEBAYASHI SHIGETO, MUKAI TOSHIO
• Format: Patent
• Language: English
• Published: 11.07.1995
• Edition: 6
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INFORMATION STORAGE; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PHYSICS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PURPOSE:To obtain a Co/Cu multilayered film having a macro magnetoresistance effect at a high rate of film formation by depositing a thin film of an Ni-based alloy as a 1st layer on a single crystalline MgO substrate and further depositing a multilayered film consisting of thin films of a Co-based alloy and thin films of Cu on the 1st layer. CONSTITUTION:An oriented crystalline thin film of an Ni-based alloy with specified crystal faces oriented parallel to the surface of the film is deposited as a 1st layer on a crystalline MgO substrate at 0.05-0.5nm/sec rate of deposition. Thin films of a Co-based alloy and thin films of Cu are alternately deposited on the 1st layer at >=0.5nm/sec rate of deposition to deposit a multilayered film consisting of the oriented crystalline thin films of the Co-based alloy and the oriented crystalline thin films of Cu and the objective Co/Cu multilayered film having a macro magneto-resistance effect is obtd. on the substrate at a high rate of film formation.