GAS DEPOSITION DEVICE

PURPOSE:To provide a gas deposition device in which a superfine particle film free from an aggregate of superfine particles is stably formed over a long time. CONSTITUTION:A transfer pipe 31 for transferring superfine particles from a superfine particle production chamber 21 to a film formation cham...

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Bibliographic Details
Main Author FUCHIDA HIDETSUGU
Format Patent
LanguageEnglish
Published 27.06.1995
Edition6
Subjects
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Summary:PURPOSE:To provide a gas deposition device in which a superfine particle film free from an aggregate of superfine particles is stably formed over a long time. CONSTITUTION:A transfer pipe 31 for transferring superfine particles from a superfine particle production chamber 21 to a film formation chamber 41 and a nozzle 32 for ejecting the superfine particles are heated and a crucible 22 housing Au is induction-heated. A mechanism for aligning the crucible 22 and the inlet end 31a of the transfer pipe 31 is fitted, a pipe 34 for sucking superfine particles not sucked into the transfer pipe 31 to disposed and gaseous He is introduced through a gas introducing hole 25 with a mesh filter.
Bibliography:Application Number: JP19930341484