RESIST COMPOSITION

PURPOSE:To enable development with water or a dil. aq. alkali soln. by incorporating a copolymer having carboxyl groups, a compd. having an aliphatic amino group, a specified compd., a photopolymn. initiator and a triazole compd. CONSTITUTION:This resist compsn. contains a copolymer having carboxyl...

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Bibliographic Details
Main Authors SAKAKIBARA MITSUHIKO, NAITO MAKIKO
Format Patent
LanguageEnglish
Published 23.06.1995
Edition6
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS
CINEMATOGRAPHY
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PRINTED CIRCUITS
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Summary:PURPOSE:To enable development with water or a dil. aq. alkali soln. by incorporating a copolymer having carboxyl groups, a compd. having an aliphatic amino group, a specified compd., a photopolymn. initiator and a triazole compd. CONSTITUTION:This resist compsn. contains a copolymer having carboxyl groups, at least one of a compd. having an aliphatic amino group and N,N- disubstd. (meth)acrylamide, a photopolymn. initiator and a triazole compd. The copolymer having carboxyl groups is preferably a copolymer (I) having carboxyl groups obtd. by copolymerizing a multifunctional monomer or a copolymer (II) having carboxyl and epoxy groups. The copolymer I is produced by copolymerizing a monomer mixture contg. an ethylenically unsatd. monomer having a carboxyl group and a multifunctional ethylenically unsatd. monomer.
Bibliography:Application Number: JP19930339689