FORMATION OF OPTICAL WAVEGUIDE
PURPOSE:To provide the method for forming the optical waveguide capable of forming the high-performance optical waveguide by suppressing outside diffusion of a substrate material during a heat treatment and preventing the generation of a defect of the optical waveguide occurring in an impulsive aeri...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
02.06.1995
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Edition | 6 |
Subjects | |
Online Access | Get full text |
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Abstract | PURPOSE:To provide the method for forming the optical waveguide capable of forming the high-performance optical waveguide by suppressing outside diffusion of a substrate material during a heat treatment and preventing the generation of a defect of the optical waveguide occurring in an impulsive aerial discharge in a temp. rising process. CONSTITUTION:This method for forming the optical waveguide comprises patterning and forming a metallic thin film 4 on the surface of the substrate 3 consisting of an electrooptical material contg. a material having a high vapor pressure and heating this substrate to thermally diffuse the metal of the thin-film patterns on the substrate. Another substrate consisting of the same material as the material of the substrate formed with the metallic thin-film patterns is disposed to face the substrate formed with the patterns leaving a slight spacing between both and these substrate are arranged in this state in a heating furnace 1 and are heated while the substrates are exposed to gaseous oxygen contg. steam at least in the temp. rising process. |
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AbstractList | PURPOSE:To provide the method for forming the optical waveguide capable of forming the high-performance optical waveguide by suppressing outside diffusion of a substrate material during a heat treatment and preventing the generation of a defect of the optical waveguide occurring in an impulsive aerial discharge in a temp. rising process. CONSTITUTION:This method for forming the optical waveguide comprises patterning and forming a metallic thin film 4 on the surface of the substrate 3 consisting of an electrooptical material contg. a material having a high vapor pressure and heating this substrate to thermally diffuse the metal of the thin-film patterns on the substrate. Another substrate consisting of the same material as the material of the substrate formed with the metallic thin-film patterns is disposed to face the substrate formed with the patterns leaving a slight spacing between both and these substrate are arranged in this state in a heating furnace 1 and are heated while the substrates are exposed to gaseous oxygen contg. steam at least in the temp. rising process. |
Author | ICHIKAWA TOMONORI YASUMA YASUHIRO |
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Notes | Application Number: JP19930312880 |
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RelatedCompanies | FUJI ELELCTROCHEM CO LTD |
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Snippet | PURPOSE:To provide the method for forming the optical waveguide capable of forming the high-performance optical waveguide by suppressing outside diffusion of a... |
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SubjectTerms | OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS |
Title | FORMATION OF OPTICAL WAVEGUIDE |
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