FORMATION OF OPTICAL WAVEGUIDE

PURPOSE:To provide the method for forming the optical waveguide capable of forming the high-performance optical waveguide by suppressing outside diffusion of a substrate material during a heat treatment and preventing the generation of a defect of the optical waveguide occurring in an impulsive aeri...

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Bibliographic Details
Main Authors ICHIKAWA TOMONORI, YASUMA YASUHIRO
Format Patent
LanguageEnglish
Published 02.06.1995
Edition6
Subjects
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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Summary:PURPOSE:To provide the method for forming the optical waveguide capable of forming the high-performance optical waveguide by suppressing outside diffusion of a substrate material during a heat treatment and preventing the generation of a defect of the optical waveguide occurring in an impulsive aerial discharge in a temp. rising process. CONSTITUTION:This method for forming the optical waveguide comprises patterning and forming a metallic thin film 4 on the surface of the substrate 3 consisting of an electrooptical material contg. a material having a high vapor pressure and heating this substrate to thermally diffuse the metal of the thin-film patterns on the substrate. Another substrate consisting of the same material as the material of the substrate formed with the metallic thin-film patterns is disposed to face the substrate formed with the patterns leaving a slight spacing between both and these substrate are arranged in this state in a heating furnace 1 and are heated while the substrates are exposed to gaseous oxygen contg. steam at least in the temp. rising process.
Bibliography:Application Number: JP19930312880