IMAGE FORMING MATERIAL AND IMAGE FORMING METHOD USING THE SAME

PURPOSE:To provide the image forming material having a high sensitivity, high resolving power and high image quality and excellent resist properties and stability and the image forming method which is good in workability and productivity and is advantageous in terms of cost effectiveness by using th...

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Bibliographic Details
Main Authors TSUBAKII YASUO, HYODO KENJI, HARADA JUNJI
Format Patent
LanguageEnglish
Published 23.05.1995
Edition6
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
AUXILIARY PROCESSES IN PHOTOGRAPHY
CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS
CINEMATOGRAPHY
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES
PHYSICS
PRINTED CIRCUITS
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Summary:PURPOSE:To provide the image forming material having a high sensitivity, high resolving power and high image quality and excellent resist properties and stability and the image forming method which is good in workability and productivity and is advantageous in terms of cost effectiveness by using this material. CONSTITUTION:This image forming material is constituted by laminating a base body, a nonphotosensitive resist layer and silver halide gelatin emulsion layers in this order and adhering a base for peeling with a tacky adhesive. This image forming method using the image forming material comprises exposing images on the image forming material, developing the material to form silver image parts on the silver halide gelatin emulsion layers, subjecting the silver image parts to etching and bleaching to expose the nonphotosensitive resist layer, subjecting the nonphotosensitive resist layer to resist eluting development to expose the base body, etching away this base body if the base body is exposed in some cases, then removing the remaining silver halide gelatin emulsion layers and the nonphotosensitive resist layer and peeling the base for peeling and the tacky adhesive from the base body in a necessary stage.
Bibliography:Application Number: JP19930279118