CATALYTIC SOLUTION FOR ELECTROLESS PLATING SELECTIVE TO COPPER-BASED MATERIAL
PURPOSE:To subject only a Cu-based material in electronic parts to selective electroless plating with a metal by treating the electronic parts with a catalytic soln. for electroless plating contg. a Pd compd. and halide or sulfate of an alkali metal or an alkaline earth metal. CONSTITUTION:A printed...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
13.01.1995
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Edition | 6 |
Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE:To subject only a Cu-based material in electronic parts to selective electroless plating with a metal by treating the electronic parts with a catalytic soln. for electroless plating contg. a Pd compd. and halide or sulfate of an alkali metal or an alkaline earth metal. CONSTITUTION:A printed board composed of an insulator and a Cu-based conductor is immersed in a catalytic aq. soln. contg. 0.0001-0.5mol/l Pd compd. such as (NH4)2(PdCl6) and 0.1-10mol/l at least one of halides or sulfates of alkali metals such as Na and K or alkaline earth metals such as Ca and Mg to activate the Cu-based conductor and then the printed board is immersed in an electroless plating bath such as an Ni, Pd or Pd-Ni plating bath. A plating layer of Ni, Pd, Pd-Ni, etc., is stably and selectively formed by electroless plating only on the Cu-based conductor of the printed board without causing bridging or skipping phenomenon. |
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Bibliography: | Application Number: JP19930158450 |