RADIATION SENSITIVE RESIST COMPOSITION

PURPOSE:To provide a positive radiation sensitive resist compsn. excellent in dry etching resistance, having high sensitivity and hardly generating scum to a resist profile. CONSTITUTION:This radiation sensitive resist compsn. contains an alkali-soluble resin, 1,2-naphthoquinonediazido-4-sulfonic es...

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Bibliographic Details
Main Authors KANATSUKI SHIGEYOSHI, OOSETO HIROKI, KATAOKA MUTSUO
Format Patent
LanguageEnglish
Published 22.12.1994
Edition5
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE:To provide a positive radiation sensitive resist compsn. excellent in dry etching resistance, having high sensitivity and hardly generating scum to a resist profile. CONSTITUTION:This radiation sensitive resist compsn. contains an alkali-soluble resin, 1,2-naphthoquinonediazido-4-sulfonic ester or 1,2-naphthoquinonediazido-5- sulfonic ester and carboxyindene-3-sulfonic ester or carboxyindene-4-sulfonic ester.
Bibliography:Application Number: JP19930138462