RADIATION SENSITIVE RESIST COMPOSITION

PURPOSE:To provide a positive radiation sensitive resist compsn. excellent in dry etching resistance and resolution and having high sensitivity. CONSTITUTION:This radiation sensitive resist compsn. contains an alkali-soluble resin and ester consisting of 2,3,4,4'-tetrahydroxybenzophenone and 1,...

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Bibliographic Details
Main Authors KANATSUKI SHIGEYOSHI, OOSETO HIROKI, KATAOKA MUTSUO
Format Patent
LanguageEnglish
Published 22.12.1994
Edition5
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE:To provide a positive radiation sensitive resist compsn. excellent in dry etching resistance and resolution and having high sensitivity. CONSTITUTION:This radiation sensitive resist compsn. contains an alkali-soluble resin and ester consisting of 2,3,4,4'-tetrahydroxybenzophenone and 1,2- naphthoquinonediazido-4-sulfonic acid and having >=99wt.% total content of mono-, di- and triesters.
Bibliography:Application Number: JP19930138461