DEVELOPER FOR PHOTOSENSITIVE POLYIMIDE PRECURSOR

PURPOSE:To control the developing rate during development and to obtain a positive fine polyimide pattern with likelihood by preparing an alkali soln. containing amino alcohols and other alkali. CONSTITUTION:This developer is an alkali soln. containing 0.5-30wt.% aminoalcohols and other alkali excep...

Full description

Saved in:
Bibliographic Details
Main Authors ASANO MASAYA, KUSANO KAZUTAKA, EGUCHI MASUICHI
Format Patent
LanguageEnglish
Published 28.10.1994
Edition5
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:PURPOSE:To control the developing rate during development and to obtain a positive fine polyimide pattern with likelihood by preparing an alkali soln. containing amino alcohols and other alkali. CONSTITUTION:This developer is an alkali soln. containing 0.5-30wt.% aminoalcohols and other alkali except for aminoalcohols. The aminoalcohols in the developer are pereferably, monoethanolamine, diethanolamine, and isopropanolamine. The alkali except for aminoalchols is preferably tetramethylammonium hydroxide soln. tetraethylammonium hydroxide soln., choline soln., and these alkalis are used in a single or mixed form. Further, a potassium chloride soln., lithium chloride soln. etc., may be used as a controlling agent. This developer may contain an additive component as far as the effect is not decreased.
Bibliography:Application Number: JP19930090130