ION BEAM PROCESSING MACHINE

PURPOSE:To provide the ion beam processing machine capable of executing fine processing with a resolving power of a specific value or below. CONSTITUTION:This ion beam processing machine is provided with a high- brightness ion source 75, an electrode 77 for drawing a high-brightness ion beam 78 out...

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Bibliographic Details
Main Authors MIYAUCHI TAKEOKI, SHIMASE AKIRA, YAMAGUCHI HIROSHI
Format Patent
LanguageEnglish
Published 21.10.1994
Edition5
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE:To provide the ion beam processing machine capable of executing fine processing with a resolving power of a specific value or below. CONSTITUTION:This ion beam processing machine is provided with a high- brightness ion source 75, an electrode 77 for drawing a high-brightness ion beam 78 out of the ion source, electrostatic lenses 80 to 83 for focusing the high-brightness ion beam 78 as <=0.5mum spot onto a work 74, electrodes 84, 85 for deflecting the focused ion beam and a vacuum container provided with a blanking electrode 84 for irradiating the work 74 with the high-brightness ion beam 78 and stopping the irradiation. Further, the machine is provided with a sample exchange chamber 51 which is connected with a discharge means and into which the work 74 is introduced and a sample chamber 50 which includes a stage 65 to be placed with the work 74. The machine is provided with a detector 95 for detecting the secondary charge particles generated from the work 74 by the ion beam spot, an observing means 96 for forming and observing the SIM image at the correcting point on the work in accordance with the signal obtd. therefrom and a control means 94 for controlling the deflecting electrodes.
Bibliography:Application Number: JP19930237886