HOT-WATER EXTRACTION JIG FOR WAFER
PURPOSE:To reduce the required amount of an extraction liquid to a minimum by a method wherein the title jig is constituted of a back-type container for a semiconductor wafer, of a first ring and a second ring which are opened partly and of a third ring which is not provided with an opening and the...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
09.09.1994
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Edition | 5 |
Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE:To reduce the required amount of an extraction liquid to a minimum by a method wherein the title jig is constituted of a back-type container for a semiconductor wafer, of a first ring and a second ring which are opened partly and of a third ring which is not provided with an opening and the interleaving amount of the container is adjusted by the first and second rings. CONSTITUTION:A back-type container 2 is put on a first ring 3, and an opening part in the container 2 is set to the same direction as an opening part 4 in the ring 3. Then, a wafer 1 for analysis is put into the container 2 in such a way that it is situated in the center of the ring 3. Then, an opening part 6 in a second ring 5 is made to coincide with the opening part 4 on the container 2, the ring 3 is overlapped with the ring 5 so as to be fitted to the inside, the ring is pressurized from the upper part, and the rings 3, 5 are fitted. When an amount by which the container 2 is interleaved with the rings 3, 5 is adjusted, the amount of an extraction liquid 8 inside the container 2 can be adjusted. Then, the extraction liquid 8 is injected into the container 2, a third ring 7 is fitted to the ring 5, and hot water is extracted. By this method, a liquid amount by which the wafer 1 comes into perfect contact with the extraction liquid 8 can be reduced to a minimum. |
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Bibliography: | Application Number: JP19930039773 |