SEMICONDUCTOR EXPOSURE DEVICE

PURPOSE:To enable accurate measurement of a position of a semiconductor substrate in a direction of exposure light. CONSTITUTION:A semiconductor exposure device wherein a pattern formed in an original film is illuminated and the pattern is transferred by exposure on a semiconductor substrate through...

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Bibliographic Details
Main Authors KAWAI KENICHI, YAMAGUCHI KINYA
Format Patent
LanguageEnglish
Published 02.09.1994
Edition5
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE:To enable accurate measurement of a position of a semiconductor substrate in a direction of exposure light. CONSTITUTION:A semiconductor exposure device wherein a pattern formed in an original film is illuminated and the pattern is transferred by exposure on a semiconductor substrate through a projection optical system is provided with a position measurement means which causes resonance between a semiconductor substrate surface and an ultrasonic oscillator by generating ultrasonic waves toward a semiconductor substrate surface 101 by a ultrasonic oscillator 103, detects its resonance frequency and obtains the position of a semiconductor substrate to the projection optical system based on the detection value, and a means for focusing for exposure based on the measurement value.
Bibliography:Application Number: JP19930053205