METHOD OF WASHING

• Main Authors: HORIE HIROSHI, MIYATA NORIYUKI, KISHII SADAHIRO, SATO YASUHISA
• Format: Patent
• Language: English
• Published: 19.08.1994
• Edition: 5
• Subjects: BASIC ELECTRIC ELEMENTS; CLEANING; CLEANING IN GENERAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; SEMICONDUCTOR DEVICES; TRANSPORTING

PURPOSE:To make it possible to sufficiently remove particles without damaging parts of semiconductor devices such as wiring made of Al. CONSTITUTION:A semiconductor wafer 8 to be washed is arranged between a electrode 3 and an electrode 4 both facing to each other in a solute 7, and alternating curr...