PROJECTION EXPOSURE METHOD

PURPOSE:To improve throughput, and to enhance the accuracy of alignment by a method wherein the positions of at least three original-image patterns in first original-image patterns transferred are detected, the positions of the array of the first original-image patterns are obtained on the basis of...

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Bibliographic Details
Main Authors TSUYUKI HISAMASA, SUGIYAMA HIDEJI
Format Patent
LanguageEnglish
Published 28.01.1994
Edition5
Subjects
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Summary:PURPOSE:To improve throughput, and to enhance the accuracy of alignment by a method wherein the positions of at least three original-image patterns in first original-image patterns transferred are detected, the positions of the array of the first original-image patterns are obtained on the basis of the results of the detection and second original-image patters are superposed and transferred at the obtained positions. CONSTITUTION:The data of (xc, yc), (xo, yo) and (xd, yd) are input to an X waviness-error correction computing circuit 16, and an X waviness error is obtained. A Y pitch error is acquired similarly by a Y pitch-error correction computing circuit 17. The data of (xa, ya), (xo, yo) and (xb, yb) are input to a Y waviness-error correction computing circuit 18, and a Y waviness error is obtained. An X pitch error is acquired similarly by an X pitch-error correction computing circuit 19. The data of (xd, yd), (xc, yc), (xa, ya) and (xb, y) are input to a straightness-error correction computing circuit 20, and a straightness error is acquired. The final target position of a stage is obtained by the result of computation acquired by these computing circuits.
Bibliography:Application Number: JP19920249109