PATTERN POSITION MEASURING APPARATUS

PURPOSE:To determine the position of flexure corresponding to the shape of flexure on different pattern forming face by determining the position of pattern under flexure-free state and storing the shape of flexure occurring at different position. CONSTITUTION:A main controller 20 reads out output vo...

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Bibliographic Details
Main Authors IZAWA HISAO, TAKAOKA KAZUHIRO, OTOTAKE TARO
Format Patent
LanguageEnglish
Published 25.01.1994
Edition5
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CALCULATING
CINEMATOGRAPHY
COMPUTING
COUNTING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
MATERIALS THEREFOR
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
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Summary:PURPOSE:To determine the position of flexure corresponding to the shape of flexure on different pattern forming face by determining the position of pattern under flexure-free state and storing the shape of flexure occurring at different position. CONSTITUTION:A main controller 20 reads out output voltage from an optical unit 12 to measure the height H31 of pattern forming face and stores the position of an XY stage 15 corresponding to a measuring point 31a. The controller 20 determines the heights H31b-H31z of pattern forming face at measuring points 31b-31z on a board 10 and determines the shape of flexure on an X-direction line 32a from the relationship between the heights of measuring points 31a-31e and the position of the stage 15, and furthermore, determines the condition of flexure on a Y-direction line 32b for the height measuring points 31a-31v. Edge signals are then obtained from light receiving elements 50a, 50b, 51a, 51b through scanning with a spot light projected from the optical unit 12 and the position of the stage 15, at the time of provision of an edge detection signal, is determined based on position signals delivered from interferometer systems 14a, 14b thus determining and indicating 21 the distance between patterns under a state where the pattern forming face is supported while directing downward.
Bibliography:Application Number: JP19920176879