EXCIMER LASER DEVICE

PURPOSE:To lessen the deterioration of gas in an excimer laser device, and to contrive the extension of life of the device. CONSTITUTION:In an excimer laser device using the mixed gas of halogen gas and dilute gas as a laser medium, at least either of the insulator of a gas contact part and a struct...

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Bibliographic Details
Main Authors MATSUSHITA YOSHIFUMI, TSUBOI SHUNGO, NAKATANI HAJIME, MINAGAWA TADAO
Format Patent
LanguageEnglish
Published 14.06.1994
Edition5
Subjects
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Summary:PURPOSE:To lessen the deterioration of gas in an excimer laser device, and to contrive the extension of life of the device. CONSTITUTION:In an excimer laser device using the mixed gas of halogen gas and dilute gas as a laser medium, at least either of the insulator of a gas contact part and a structural member consists of ceramic containing Si of 1wt.% or less in terms of SiO2. As a result, the generation of impurities such as SiF4 and the like can be suppressed, and the life of gas can be prolonged.
Bibliography:Application Number: JP19910234772