RESIST REMOVING METHOD

PURPOSE:To provide the resist removing method capable of completely releasing and removing the resist variously denatured during the formation step of semiconductor chip, causing no damage to an underneath film, etc., and leaving no residue at all. CONSTITUTION:Resist 14 is removed by ashing step by...

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Bibliographic Details
Main Author KASE MASA
Format Patent
LanguageEnglish
Published 14.06.1994
Edition5
Subjects
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