PURIFICATION OF HARMFUL GAS

PURPOSE:To remove harmful nitrogen fluoride such as nitrogen trifluoride, nitrogen tetrafluoride or nitrogen difluoride contained in the gas discharged from a semiconductor manufacturing process. CONSTITUTION:Gas containing nitrogen fluoride such as nitrogen trifluoride is passed through a purifying...

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Bibliographic Details
Main Authors IWATA KEIICHI, HATAKEYAMA TOSHIYA
Format Patent
LanguageEnglish
Published 17.05.1994
Edition5
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEMICONDUCTOR DEVICES
SEPARATION
TRANSPORTING
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Summary:PURPOSE:To remove harmful nitrogen fluoride such as nitrogen trifluoride, nitrogen tetrafluoride or nitrogen difluoride contained in the gas discharged from a semiconductor manufacturing process. CONSTITUTION:Gas containing nitrogen fluoride such as nitrogen trifluoride is passed through a purifying cylinder to be brought into contact with a purifying agent based on metal zinc and metal aluminum under heating.
Bibliography:Application Number: JP19920288479