METHOD OF FORECASTING FINISHED SHAPE OF PHOTORESIST AND DEVICE THEREFOR

• Main Authors: TANI YOSHIYUKI, SASAKO MASARU, SEKIGUCHI ATSUSHI, SENSU YOSHIHISA, MINAMI YOICHI, YAMASHITA KAZUHIRO
• Format: Patent
• Language: English
• Published: 22.04.1994
• Edition: 5
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE:To forecast a finished shape of a photoresist without taking time and correctly by quantification of a multiinterference effect of a photoresist film while forecasting a finished shape of the photoresist basing on the multiinterference effect of a quantified photoresist film. CONSTITUTION:A developing means 2 forming a photoresist on a semiconductor substrate by developing a photoresist film exposed after being applied on the semiconductor substrate 1, a light source 3 emitting light not exposing the photoresist film, a light irradiation means 4 irradiating it with the light emitting from the light source 3 on the semiconductor substrate 1, a light-detecting means 5 detecting reflection light reflecting from the semiconductor substrate 1, a signal converting means 6 outputting the reflection light detected by the light detecting means 5 while being converted into an electric signal and a data processing means 7 forecasting a finished shape of the photoresist while performing data processing of the electronic signal being outputted from a signal conversion means 6 are provided so as to allow a correct forecast of a finished shape.