PARTICLE DEVIATION PREVENTIVE DEVICE OF CENTRIFUGALLY FLUIDIZED BED

PURPOSE:To uniformize the thickness of a particle layer and to prevent the degradation in reactivity by preventing the deviation in the particles of a centrifugally fluidized bed for treating exhaust gases, etc. CONSTITUTION:Plural partition plates 32 are disposed within a fluidized bed reactor 14 s...

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Bibliographic Details
Main Authors SAKAKIDA YASUSHI, TAKADA TOMOAKI, TSUTSUMI KAZUO
Format Patent
LanguageEnglish
Published 19.04.1994
Edition5
Subjects
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
THEIR RELEVANT APPARATUS
TRANSPORTING
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Summary:PURPOSE:To uniformize the thickness of a particle layer and to prevent the degradation in reactivity by preventing the deviation in the particles of a centrifugally fluidized bed for treating exhaust gases, etc. CONSTITUTION:Plural partition plates 32 are disposed within a fluidized bed reactor 14 so as to exist between a dispersion plate 16 and a cylindrical filter 28 to control the deviation of the particles. A dust removing mechanism is provided adjacently to this cylindrical filter 28.
Bibliography:Application Number: JP19920285086