ION BEAM SPUTTERING DEVICE

PURPOSE:To form a film of crystal with high bonding energy, such as cubic boron nitride by the ion beam sputtering system. CONSTITUTION:Prior to the adhesion of ion beam sputter grains 4 to a substrate 5, the sputter grains 4 are formed into excited state by means of a plasma source 10. On the other...

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Bibliographic Details
Main Authors ARIMATSU KEIJI, YAMAGUCHI HIROSUKE, HAGITANI TAKASHI, ISHIKAWA YASUSHI
Format Patent
LanguageEnglish
Published 12.04.1994
Edition5
Subjects
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Summary:PURPOSE:To form a film of crystal with high bonding energy, such as cubic boron nitride by the ion beam sputtering system. CONSTITUTION:Prior to the adhesion of ion beam sputter grains 4 to a substrate 5, the sputter grains 4 are formed into excited state by means of a plasma source 10. On the other hand, an ion beam is formed by ionizing reactant gas. The sputter grains 4 in excited state are irradiated with the ion beam, and these are allowed to react and deposited on the substrate 5 and formed into a film. By this method a film of cubic boron nitride, etc., as super hard material can be formed on the substrate with high adhesion, and as a result, the service life and efficiency of tools, dies, etc., can be prolonged and increased.
Bibliography:Application Number: JP19920253225