METHOD AND APPARATUS FOR REMOVING ORGANIC COMPOUND FILM

• Main Authors: JINBO SADAYUKI, MORI HARUKI
• Format: Patent
• Language: English
• Published: 09.04.1993
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE:To effectively remove an organic compound film at a high rate without damaging a sample by introducing a radical containing a halogen element and gas containing a hydrogen element into a reaction vessel through a double tube, and setting a ratio of flow velocities of both to a special value. CONSTITUTION:A radical containing a halogen element is supplied to a material 4 to be treated placed in a reaction chamber through a first tube 1 of a double tube. Gas containing a hydrogen element is supplied to the material 4 through a second tube 2. Here, a practical reaction rate is obtained in a range of 0.2<H1/H2<5 of a ratio H1/H2 of the flow velocity (H1) of the gas containing the hydrogen element to the flow velocity (H2) of the radical containing the halogen element. Thus, organic compound can be removed uniformly at a high treatment pate without damaging the material.