PRODUCTION OF OPTICAL DISK

• Main Authors: ANZAI YUMIKO, HORIGOME SHINKICHI, MIYAMURA YOSHINORI, KATO KEIZO, SHIRAISHI HIROSHI
• Format: Patent
• Language: English
• Published: 12.03.1993
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULARARTICLES; INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS; INFORMATION STORAGE; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER; PERFORMING OPERATIONS; PHYSICS; PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCESIN A PLASTIC STATE; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

PURPOSE:To produce large quantities of optical disks in a short period of time by executing exposing while bringing the mask-side surface of a substrate with a light non-transparent mask into tight contact with the resist side surface of a substrate with a photoresist film. CONSTITUTION:The photoresist 3 is applied on the glass substrate 1 with the chromium mask 2 and is irradiated with a condensed laser beam 5 according to information. The chromium mask with information patterns is thereafter obtd. by developing and etching. The photoresist mask of a positive type is brought into tight contact with a silicon wafer, quartz, glass or metallic plate 6 and is exposed and developed to form patterns on the photoresist; thereafter, the photoresist is dry etched, by which a stamper 6-1 having the recessed patterns is obtd. If one sheet of the chromium mask is produced by cutting, many sheets of the recessed pattern stampers can be thereafter easily produced in a short period of time according to this method.