JPH05332986
PURPOSE:To measure Si concentration in blast furnace molten iron with a high speed and high accuracy for controlling removal of Si so as to dose an appropriate agent for removing Si. CONSTITUTION:An Si activity in blast furnace molten iron 5 that is measured by means of a probe 1 operated with an ox...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
17.12.1993
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Edition | 5 |
Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE:To measure Si concentration in blast furnace molten iron with a high speed and high accuracy for controlling removal of Si so as to dose an appropriate agent for removing Si. CONSTITUTION:An Si activity in blast furnace molten iron 5 that is measured by means of a probe 1 operated with an oxygen concentration battery using solid electrolyte is corrected by using the other solute concentration to improve its accuracy. For example, corrective computation is performed by a process computer 2 to obtain an Si concentration quickly and accurately. Therefore, the dosage of an agent for removing Si can be calculated quickly and accurately, thus improving the accuracy of continuous Si removal control. |
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Bibliography: | Application Number: JP19920142295 |