SEMICONDUCTOR MANUFACTURE APPARATUS

PURPOSE:To reduce particles adhering to a semiconductor wafer inside a reaction chamber in a CVD apparatus or the like. CONSTITUTION:A CVD apparatus 1 is formed in the following manner: gas- blowoff preventive covers 11 are installed near opening parts 9a for gas introduction pipes 9 which are insta...

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Bibliographic Details
Main Author UDO TSUTOMU
Format Patent
LanguageEnglish
Published 10.12.1993
Edition5
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE:To reduce particles adhering to a semiconductor wafer inside a reaction chamber in a CVD apparatus or the like. CONSTITUTION:A CVD apparatus 1 is formed in the following manner: gas- blowoff preventive covers 11 are installed near opening parts 9a for gas introduction pipes 9 which are installed inside a reaction chamber 4 which houses semiconductor wafers 5; and a gas which is spouted from the opening parts 9a is not blown directly onto the semiconductor wafers 5.
Bibliography:Application Number: JP19920132079