JPH05243127

PURPOSE:To precisely draw fine patterns by pertinently discriminating respective patterns between large and small figures according to the shapes thereof. CONSTITUTION:A computer computes the spaces S of respective patterns according to data and when the threshold values do not exceed So, the spaces...

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Bibliographic Details
Main Author IWANAGA MASAKAZU
Format Patent
LanguageEnglish
Published 21.09.1993
Edition5
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE:To precisely draw fine patterns by pertinently discriminating respective patterns between large and small figures according to the shapes thereof. CONSTITUTION:A computer computes the spaces S of respective patterns according to data and when the threshold values do not exceed So, the spaces S are assumed as small figures. However, when the spaces S>=S0, the peripheral length L of the patterns is computed and if the ratio (S/L) exceeds the threshold value epsilon0, the pattern is assumed as a large figure while if epsilon>=epsilon0, the pattern is assumed as the small figure. Within the title charged particle beam exposing method, a beam exposure controller 14 is to control a driving mechanism 20 of a stage 19, a DA converter 15 controlling a molding deflector 5, another DA converter 16 controlling an alignment deflector 9, a control circuit 18 of a blanking electrode 17 blanking electron beams EB and a control power supply 21 of an electron gun 1 according to the data containing those on the size of figures.
Bibliography:Application Number: JP19910079862