HIGH-IMPACT POLYSTYRENE RESIN AND ITS PRODUCTION

PURPOSE:To obtain the subject resin excellent in the balance between impact resistance and gloss by dispersing a specified impact modifier in a PS resin. CONSTITUTION:The objective resin is prepared by dispersing 3-30wt.% impact modifier comprising 10-98 pts.wt. styrene/butadiene diblock copolymer o...

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Bibliographic Details
Main Authors MATSUDA HIROAKI, ONISHI SHUSUKE
Format Patent
LanguageEnglish
Published 15.06.1993
Subjects
CHEMISTRY
COMPOSITIONS BASED THEREON
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:PURPOSE:To obtain the subject resin excellent in the balance between impact resistance and gloss by dispersing a specified impact modifier in a PS resin. CONSTITUTION:The objective resin is prepared by dispersing 3-30wt.% impact modifier comprising 10-98 pts.wt. styrene/butadiene diblock copolymer of a weight-average molecular weight of 30000-500000, a total combined styrene content of 30-85wt.% and a block styrene content of at least 60% based on the total combined styrene content and 2-90 pts.wt. styrene/butadiene copolymer of a weight-average molecular weight of 1000-1000000 and a total combined styrene content of 0-15wt.% and/or polybutadiene in a PS resin, wherein the impact modifier is present in the form of particles of a mean particle diameter of 0.3-0.7mum.
Bibliography:Application Number: JP19910337994