VACUUM VAPOR DEPOSITION DEVICE

• Main Author: HASHIDATE YOSHIO
• Format: Patent
• Language: English
• Published: 14.05.1993
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PURPOSE:To provide an economically favorable vacuum vapor deposition device which is possible to recover by surely and continuously liquidizing a depositing material stuck to a vapor recovering plate and is possible to continuously work for a long period. CONSTITUTION:The vacuum vapor deposition device is constituted by providing a vapor enclosed vessel in a vacuum chamber, by arranging a crucible housing the depositing material under the vapor enclosed vessel, by vaporizing the depositing material housed in the crucible by heating with an electron gun and by depositing the depositing material vaporized on a substrate provided above the crucible to form a vapor deposited film. And the depositing material vaporizing in different direction from direction to the substrate is deposited on a recovering surface of the vapor recovering plate provided on a different position from the substrate and the depositing material is heated to liquidize, flows down along the recovering surface of the vapor recovering plate and is recovered in the crucible. Furthermore, plural of the groove 22,23 are formed on whole area of the recovering surface of the vapor recovering plate 21 so that the depositing material almost uniformly flows down along the recovering surface of the recovering plate.