POSITIVE PHOTORESIST COMPOSITION

• Main Authors: OTSUKI YUTAKA, YODA EIJI, SATO HARUYOSHI, YAMASHITA YUKIO, YUASA HITOSHI
• Format: Patent
• Language: English
• Published: 27.03.1992
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PRINTED CIRCUITS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

PURPOSE:To obtain the effective photoresist by using a resin introduced with the group expressed by specific formula in a part of the double bond part of a high-polymer compd. (A) having prescribed carbon-carbon double bonds and a compd. contg. a quinonediazide unit as constituting components. CONSTITUTION:The high-polymer compd. (A) has 300 to 30,000mol.wt., 50 to 500 iodine value and the carbon-carbon double bonds. The group can be introduced into at least a part of the double bond parts is expressed is expressed by formula, where R denotes a hydrogen atom, halogen atom or 1 to 3C alkyl group; R denotes 1 to 10C alkyl group, cycloalkyl group, aryl group. This compsn. is formed by using 2, 3, 4-trihydroxybenzophenone, etc., and the compounding ratio of this component is specified to 25 to 100pts.wt. per 100pts. wt. component A. The compsn. is neutralized by an org. amine and is dispersed or dissolved in water.