SPUTTERING DEVICE

• Main Author: ONO KATSUYUKI
• Format: Patent
• Language: English
• Published: 23.03.1992
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PURPOSE:To provide excellent magnetic anisotropy to a thin film formed on a sample substrate surface by disposing a sample holder in a manner that the sample mounting surface of the holder is along the center axis of a divergent magnetic field in a sample chamber, and disposing a target facing to the sample holder. CONSTITUTION:The sample holder 20 is disposed near a plasma drawing window 16 in the sample chamber 12 in a manner that the sample mounting surface of the sample holder 19 is along the center axis of the divergent magnetic field. Namely, the sample holder 20 is disposed almost parallel or slightly inclining to the center axis of the divergent magnetic field. The sample holder 20 is equipped in its inside with water cooling mechanism and heating mechanism to heat the sample substrate 19 for annealing. On the other hand, a target 21 comprising the material for formation of a film is disposed at the position opposite to the sample holder 20 for the center axis of the magnetic field. Therefore, when the divergent magnetic field is produced in the area from the plasma producing chamber 11 to the sample chamber 12 by an energizing coil 18, a magnetic field of certain direction is formed on the surface of the sample substrate 19 on the holder 20.