VACUUM VAPOR DEPOSITION APPARATUS

PURPOSE:To surely and continuously recover a vapor deposited material stuck to a vapor recovering plate under liquefying, to enable continuous operation for long time and to provide a vacuum vapor depositing apparatus economically profitable by dividing the vapor recovering plate into plural zones a...

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Bibliographic Details
Main Author HASHIDATE YOSHIO
Format Patent
LanguageEnglish
Published 03.03.1992
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Summary:PURPOSE:To surely and continuously recover a vapor deposited material stuck to a vapor recovering plate under liquefying, to enable continuous operation for long time and to provide a vacuum vapor depositing apparatus economically profitable by dividing the vapor recovering plate into plural zones and periodically varying temp. distribution at each zone. CONSTITUTION:Metal vapor 10 vaporized toward a different direction from a substrate in a vacuum vessel of the vacuum vapor depositing apparatus, is stuck to the vapor recovering plate 21 and the formed vapor deposited film 13 is heated, melted and recovered. The above vapor recovering plate 21 set symmetrically to right and left directions inclined from a upper part to a diagonal lower part of the substrate is divided into plural small area zones 22 toward a direction with a right angle to the inclining surface. In each zone 22, a heater is independently set and electric source output is periodically varied with control means so as to be possible to control at different temp. By periodically varying the temp. of heater according to recovering time, the temp. distribution in each zone 22 is varied to high temp. low temp. intermediate temp. high temp. Therefore, as the melting zone in the vapor deposited film 13 is shifted to the inclining direction in order, the vapor deposited film 13 stuck to the vapor recovering plate 21 can surely be recovered without detaching and falling down.
Bibliography:Application Number: JP19900178603