PURIFICATION OF FINE PARTICLE CONSISTING ESSENTIALLY OF SIO2

PURPOSE:To remove impurities at a low cost, by adjusting aqueous slurry consisting essentially of SiO2 to proper pH, immersing a specific disc in the slurry, rotating the disc and adsorbing the impurities on the disc. CONSTITUTION:SiO2 fine particles containing impurities such as Al2O3 and Fe2O3 is...

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Bibliographic Details
Main Author MOTOMURA ISAMU
Format Patent
LanguageEnglish
Published 19.02.1992
Subjects
CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
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Summary:PURPOSE:To remove impurities at a low cost, by adjusting aqueous slurry consisting essentially of SiO2 to proper pH, immersing a specific disc in the slurry, rotating the disc and adsorbing the impurities on the disc. CONSTITUTION:SiO2 fine particles containing impurities such as Al2O3 and Fe2O3 is mixed with water into slurry and adjusted to pH4-6 or 7.5-8.5. Then, a disc made of SiO2 or a disc made of barium ferrite or strontium ferrite is immersed in the slurry, rotated and the impurities existing in the SiO2 fine particles are adsorbed on the disc and removed.
Bibliography:Application Number: JP19900159867