DEVICE FOR ANALYZING RHEED

PURPOSE:To enable analysis within a micro area by emitting an electron beam at a relatively large angle to a sample surface from an electron gun, and curving the beam track using a deflector so that the track is at a small angle to the surface. CONSTITUTION:An electron beam 15 focused by an electron...

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Bibliographic Details
Main Author MITAMURA SHIGEHIRO
Format Patent
LanguageEnglish
Published 18.12.1992
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Summary:PURPOSE:To enable analysis within a micro area by emitting an electron beam at a relatively large angle to a sample surface from an electron gun, and curving the beam track using a deflector so that the track is at a small angle to the surface. CONSTITUTION:An electron beam 15 focused by an electron lens 16 located at the end of an electron gun 10 is projected at an angle alpha of projection to the surface of a sample 20. The angle alpha is larger than 1-2 deg. required to analyze reflected high energy electron beam diffraction (RHEED). Next the beam 15 has its track curved by a downward electrostatic field formed by both the upper and lower electrodes 13 of a deflector 12 and goes out of the deflector 12 and is then incident on a target part 17 of the sample 20 at an angle of 1-2 deg. required to analyze RHEED. The electron beam 15 incident on the target part 17 is diffracted depending on the arrangement of atoms (or molecues) there and forms a diffractive pattern on a screen 18. The pattern 18 is analyzed using a predetermined method, whereby the surface structure of the target part 17 can be made clear.
Bibliography:Application Number: JP19910142202