JPH0433216B

PURPOSE:To uniformly form the best retention shape by applying a photo-setting adhesive agent having specific viscosity thereafter attaching synthetic resin-made beads next irradiating light by a source of light attenuating a heat ray and hardening the adhesive agent. CONSTITUTION:A photo-setting ad...

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Bibliographic Details
Main Author KITAZAWA SHINICHI
Format Patent
LanguageEnglish
Published 02.06.1992
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Summary:PURPOSE:To uniformly form the best retention shape by applying a photo-setting adhesive agent having specific viscosity thereafter attaching synthetic resin-made beads next irradiating light by a source of light attenuating a heat ray and hardening the adhesive agent. CONSTITUTION:A photo-setting adhesive agent 2 is used by compounding a cross linking monomer of acrylic system and a sensitive polymerization initiator. While synthetic resin-made beads use a material of thermal decomposition synthetic resin and normally used retention beads 3 left as is. In accordance with the normal method, a crown-shaped wax pattern 1 is formed and mounted to a supporter holding the pattern with its surface in a side of providing a coating layer in an upper direction. Next, the ultraviolet-setting adhesive agent 2, having viscosity not less than 10cp, is applied, and on top of this an acrylic resin-made retention bead 3 is sprayed adhering. And immediately using an ultraviolet ray irradiating device, an ultraviolet ray is irradiated hardening the adhesive agent. Thus, the wax pattern can be efficiently created with no necessity for a high degree of skill.
Bibliography:Application Number: JP19880270870