SUBSTRATE EXPOSING DEVICE

• Main Authors: SUGIMOTO HIDEKUNI, SUZUKI HIROSHI, IWAMA SATORU
• Format: Patent
• Language: English
• Published: 10.11.1992
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; MATERIALS THEREFOR; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

PURPOSE:To prevent a large-sized glass substrate from being deformed by temperature change. CONSTITUTION:A chuck 4 where the substrate is placed and held is provided with a path 14 where fluid for keeping the upper surface side of the chuck 4 at an almost fixed temperature is allowed to pass in the inner part of wall thickness. By supplying the fluid whose temperature is controlled in the path 14 of the chuck 4, the upper surface side of the chuck 4 is kept at the almost fixed temperature. Thus, the temperature of the large-sized substrate which is placed and held on the upper surface of the chuck 4 is kept nearly constant, and the deformation of the substrate is prevented.