MANUFACTURE OF MASK

• Main Author: KIN YOUKEN
• Format: Patent
• Language: English
• Published: 04.02.1992
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE: To make it possible to easily manufacture a mask having a semi- permanent life mask forming pattern regions and phase inversion regions on a substrate by utilizing the same photosensitive film as an etching mask. CONSTITUTION: A mask flat plate 13 and the photosensitive film 15 are successively formed on the surface of the substrate 11 and patterns 17 are exposed to the photosensitive film 15 and are developed to expose the prescribed parts of this mask flat plate 13. The mask flat plate 13 is then etched by using the nonremoved parts of the photosensitive film 15 as the etching mask. The exposed parts of the substrate 11 are etched at a prescribed depth by a glass etching liquid. Further, the mask flat plate 13 is side edged by using the photosensitive film 15 as the etching mask, by which the phase inversion regions 19 are formed. The mask is completed by removing the photosensitive film 15. As a result, the mask having the semi-permanent phase inversion regions are obtd. by the simple stages.