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Summary:PURPOSE:To surely and continuously liquify and recover the stuck vapor deposition substance by providing a vapor recovering plate in the position different from a base plate in a vacuum tank, and forming a groove continuously changed into a circular shape from a circular arc shape along inclination on the surface of the vapor recovering plate. CONSTITUTION:A vapor deposition film is formed in a vacuum tank by heating and vaporizing the vapor deposition substance housed in a crucible by irradiation of electron beams and sticking this vapor on the base plate arranged to the upside of the crucible. In the vacuum deposition device, a vapor recovering plate 21 is provided in the position different form the base plate. Unavailable vapor flow 10 vaporized in the direction different from the base plate is stuck on the surface of the vapor recovering plate 21. Thereafter, this vapor deposition substance is heated, melted and recovered. A plurality of pieces of groove continuously changed into a circular shape from a circular arc shape are formed along the downside from the upside of inclination on the recovery surface of the vapor recovering plat 21. Thereby, when the stuck vapor deposition substance is heated and melted, droplets of liquid flow down along the grooves and are recovered without separation and dropping. The device is continuously operated for a long time.
Bibliography:Application Number: JP19910047150