ION IMPLANTATION DEVICE
PURPOSE:To neutralize electrified ions completely by arranging an electron current control device to control electron quantity to neutralize the ions electrified on a semiconducting substrate. CONSTITUTION:A semiconducting substrate is housed in a chamber 2, and an ion gun 1 generates ions to be imp...
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Main Author | |
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Format | Patent |
Language | English |
Published |
07.08.1992
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Subjects | |
Online Access | Get full text |
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