FORMED MEDIUM FOR TRANSFER AND PRODUCTION THEREOF

• Main Authors: HORIGOME SHINKICHI, SUZUKI MAKOTO, ITO SHO, KATO KEIZO
• Format: Patent
• Language: English
• Published: 28.07.1992
• Subjects: GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; INFORMATION STORAGE; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER; PERFORMING OPERATIONS; PHYSICS; PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCESIN A PLASTIC STATE; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

PURPOSE:To reduce defects and to obtain a high-quality optical disk substrate by forming the rugged information pattern of a formed medium for transfer by etching. CONSTITUTION:A photoresist 3 is formed on a mirror-finished stamper with no information pattern, an information pattern 6 is formed in the photoresist 3 and etching is carried out to obtain a formed medium for transfer. Since the information pattern 6 is formed in the surface of the stamper by etching with the photoresist 3 as a mask, stress is not produced in the stamper and a high-quality patterned stamper free from a deposit causing defects is stably obtd. A high-quality optical disk substrate with a formed satisfactory information pattern can be obtd.