NEW PRODUCTION OF POLYSILANE COMPOUND

PURPOSE:To obtain the title compound for electronic device, etc., having good solvent-dissolving property and excellent film forming ability by bringing dichlorosilane monomer into contact with a condensation catalyst under high- purity inert atmosphere from which oxygen and water content are elimin...

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Bibliographic Details
Main Authors MIYAJI TOSHIE, TANAKA HISAMI
Format Patent
LanguageEnglish
Published 25.06.1992
Subjects
CHEMISTRY
COMPOSITIONS BASED THEREON
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:PURPOSE:To obtain the title compound for electronic device, etc., having good solvent-dissolving property and excellent film forming ability by bringing dichlorosilane monomer into contact with a condensation catalyst under high- purity inert atmosphere from which oxygen and water content are eliminated. CONSTITUTION:Dichlorosilane monomer is brought into contact with a condensation catalyst consisting of Mg under a high-purity inert atmosphere from which oxygen and water content are eliminated and elimination of halogen and condensation polymerization are carried out to provide the objective compound. Furthermore, reaction vessel and reagents are all preferably regarded so as not to contain oxygen and water in the reaction system.
Bibliography:Application Number: JP19900302685