NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION

• Main Authors: TAKAHASHI NORIAKI, ISHIGURO TOMOYO, SHINOZAKI MIKA, OCHIAI TAMEICHI
• Format: Patent
• Language: English
• Published: 30.04.1992
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE:To allow lithography of a high resolving power to be executed by short-time exposing by using a specific compd. as a crosslinking agent. CONSTITUTION:The compd. expressed by formula I and/or formula II is used as the crosslinking agent. In the formula I, R denotes an alkyl group; A denotes an alkyl group which may be substd., alkenyl group, aryl group or 5- to 6-membered arom. heterocyclic group; B denotes a hydrogen atom or -CH2OR ; R denotes an alkyl group. In the formula II, X denotes a bivalent org. group; D to D respectively independently denote a hydrogen atom or -CH2OR ; R denotes an alkyl group; (n) denotes 0 or 1; at least two of D to D are not the hydrogen atoms. The lithography of the high revolving power is executed by the short-time exposure in this way by using the light of the wavelength of a deep UV region.