DIVIDING METHOD FOR GAS FLOW OF VAPOR GROWTH DEVICE

PURPOSE:To spread the scope of control of a flow ratio by disposing a gas introducing pipe with a variable conductance valve in parallel with a gas introducing pipe with a mass flow controller. CONSTITUTION:A gas introducing pipe 3B with a variable conductance valve 11 is arranged in parallel with g...

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Bibliographic Details
Main Authors SUGIYAMA IWAO, EBE KOJI, MURAKAMI SATOSHI, SAKUYAMA TAKAAKI, MARUYAMA KENJI
Format Patent
LanguageEnglish
Published 10.04.1992
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Summary:PURPOSE:To spread the scope of control of a flow ratio by disposing a gas introducing pipe with a variable conductance valve in parallel with a gas introducing pipe with a mass flow controller. CONSTITUTION:A gas introducing pipe 3B with a variable conductance valve 11 is arranged in parallel with gas introducing pipes 3A, 3C with mass flow controllers 4A, AB, and gas flow rates divided into a plurality of the gas introducing pipes 3A, 3C are controlled by the variable conductance valve 11 and the mass flow controllers 4A, 4B. Accordingly, the scope of control of the flow rate of a gas is spread, thus expanding the control width of the flow ratio of the gas flowing through the gas introducing pipes 3A, 3C with the mass flow controllers 4A, 4B with the spread of the scope of control.
Bibliography:Application Number: JP19900229412