METHOD OF ADDING WEIGHT TO CRYSTAL RESONATOR

PURPOSE:To improve the accuracy of a position with a weight added thereto by adopting the dry method for the addition of the weight, and limiting the range of the addition according to a resist pattern having the plasma resistant characteristic by the photolithography. CONSTITUTION:A metallic film 1...

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Bibliographic Details
Main Author ARATAKE KIYOSHI
Format Patent
LanguageEnglish
Published 08.04.1991
Subjects
BASIC ELECTRONIC CIRCUITRY
ELECTRICITY
IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS
RESONATORS
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Summary:PURPOSE:To improve the accuracy of a position with a weight added thereto by adopting the dry method for the addition of the weight, and limiting the range of the addition according to a resist pattern having the plasma resistant characteristic by the photolithography. CONSTITUTION:A metallic film 15 is formed with sputtering on the surface of a protection film comprising a photo resist 13 with high plasma resistance performance while a crystal wafer 10, an electrode film 11 and the resist 13 are laminated. Then the metallic film 15 is lifted off together with the photo resist 13 to leave the metallic film only in the center 15 in figure. Thus, the metallic film 15 as the added weight formed in such a ray is uniform and placed with high accuracy. Thus, the accuracy of the position for adding a weight is improved.
Bibliography:Application Number: JP19890219185