FORMATION OF PYROLYTIC CARBON FILM

PURPOSE:To simplify the forming process by heating a refractory grain coated with an org. compd. capable of forming a pyrolytic carbon film to a specified temp. along with a substrate. CONSTITUTION:The refractory grain of Al2O3, SiO2, etc., having 10mum to 5mm diameter is mixed with an org. compd. c...

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Bibliographic Details
Main Authors FUNADA HITOSHI, NAKAI SHIGEO
Format Patent
LanguageEnglish
Published 15.11.1991
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Summary:PURPOSE:To simplify the forming process by heating a refractory grain coated with an org. compd. capable of forming a pyrolytic carbon film to a specified temp. along with a substrate. CONSTITUTION:The refractory grain of Al2O3, SiO2, etc., having 10mum to 5mm diameter is mixed with an org. compd. capable of forming a pyrolytic carbon film, e.g. an aromatic monomer such as toluene, synthetic resin such is phenolic resin and polyamide resin and natural resin such as rosin, and the mixture is placed in a crucible which is then closed with a lid. The crucible is put in a heating furnace, the mixture is heated in the furnace to about 600-1500 deg.C in an inert gas atmosphere of N2, etc., roasted for a specified time, then cooled to room temp. and discharged, and the refractory grain coated with a pyrolytic carbon film is obtained.
Bibliography:Application Number: JP19900056137