PROJECTION ALIGNER

• Main Author: SHODA SHUJI
• Format: Patent
• Language: English
• Published: 24.10.1991
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE:To transfer a pattern accurately in size and shape by directly observing the exposure condition of the pattern being transferred to the photosensitive material on a substrate to control the actual exposure energy. CONSTITUTION:Light is emitted onto the original pattern of a first substrate 1. The light past the pattern goes through reduction projection lenses 3 and 3' and reaches a photosensitive surface of a second substrate 4 to transfer the pattern. Light reflected from the photosensitive surface is directed to a reflector 5 at the aperture stop of the optical imaging system and led out of the optical system. The intensity of the reflected light is detected by a detector 8 located on its optical axis. The detected intensity is utilized to control the exposure energy to accurately observe the exposure condition of the photosensitive material on the second substrate 4. In such a manner, the size and shape of the transferred pattern is precisely controlled for accurate pattern transfer by a projection aligner.