VESSEL FOR ACCOMMODATING SUBSTRATE AND FORMING METHOD FOR VESSEL

PURPOSE:To prevent the accumulation of dust and eliminate the possibility of lossing an information segment, by forming, in a body, a vessel main body accommodating Si wafers and the like, and a cover member accommodating an information segment showing information like the lot number of wafers. CONS...

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Bibliographic Details
Main Author UMEDA TOSHIYA
Format Patent
LanguageEnglish
Published 26.07.1991
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Summary:PURPOSE:To prevent the accumulation of dust and eliminate the possibility of lossing an information segment, by forming, in a body, a vessel main body accommodating Si wafers and the like, and a cover member accommodating an information segment showing information like the lot number of wafers. CONSTITUTION:A vessel 1 for accommodating substrates is constituted of a vessel main body 1, an information segment 3 in which data for substrates are written, and a cover member 4 for protecting the segment 3, which are unified in a body. The cover member 4 is equipped with a recessed part 4A accommodating the information segment 3. A notch 4B and a notch 4C are formed on the front side and the rear side, respectively. Pins 4E of a right row and a left rows are planted in the inside bottom part 4D, which pins engage with the information segment 3. Penetrating holes 3A for engaging with the pins 4E of the member 4 are formed, and the information segment 3 is fixed on the member 4. In this constitution, the same resin material is used for the main body 1 and the cover member 4, which are molded by using a metal mold.
Bibliography:Application Number: JP19890314075